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Substrate rinse additive post sawing, lapping, & polishing:
VECTOR HTR is a synthetic formulation developed for the rinsing and wet storage of substrates after lapping, polishing, sawing or texturing. Used as directed, VECTOR HTR minimizes scratching from in-process handling; protects substrates from staining; and prevents hard-to-clean slurry residues from adhering to the substrate surface for more effective downstream cleaning.

VECTOR HTR is recommended for use on mono-crystalline and multi-crystalline silicon. For solar silicon producers, VECTOR HTR is used to rinse excess slurry residues from wafers post-wire sawing. Before demounting, the wafers are rinsed with a solution of 3 % to 4 % VECTORr HTR and DI water to eliminate staining and improve final cleaning results. VECTOR HTR is also used to wet-store wafers after demounting and prior to cleaning. For semiconductor silicon producers, VECTOR HTR is recommended for the rinsing/washing of lapping plates. VECTOR HTR removes process debris from both the plate’s surface and grooves, thereby preventing the formation of iron oxide/abrasive particle aggregates that can dislodge and cause scratching. When used for rinsing/washing polishing pads, VECTOR HTR prevents staining; increases pad life by keeping the pore structure open; and reduces the frequency of pad conditioning.


  • Highly economical.
  • Reduces scratching due to plate/pad contamination.
  • Minimizes scratching from in-process handling.
  • Prevents staining.
  • Facilitates downstream cleaning processes.
  • Minimizes plate/pad cleaning and maintenance.


For more detailed information, download our datasheet:

Interested in our cleaning and rinsing products?


We are happy to share our knowledge with you and remain at your disposal for any further questions.

Adam Nielsen

Product Manager Cleaning and Rinsing