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VECTOR HTR
Detergent
Substrate rinse additive post sawing, lapping, & polishing:
VECTOR HTR is a synthetic formulation developed for the rinsing and wet storage of substrates after lapping, polishing, sawing or texturing. Used as directed, VECTOR HTR minimizes scratching from in-process handling; protects substrates from staining; and prevents hard-to-clean slurry residues from adhering to the substrate surface for more effective downstream cleaning.
VECTOR HTR is recommended for use on mono-crystalline and multi-crystalline silicon. For solar silicon producers, VECTOR HTR is used to rinse excess slurry residues from wafers post-wire sawing. Before demounting, the wafers are rinsed with a solution of 3 % to 4 % VECTORr HTR and DI water to eliminate staining and improve final cleaning results. VECTOR HTR is also used to wet-store wafers after demounting and prior to cleaning. For semiconductor silicon producers, VECTOR HTR is recommended for the rinsing/washing of lapping plates. VECTOR HTR removes process debris from both the plate’s surface and grooves, thereby preventing the formation of iron oxide/abrasive particle aggregates that can dislodge and cause scratching. When used for rinsing/washing polishing pads, VECTOR HTR prevents staining; increases pad life by keeping the pore structure open; and reduces the frequency of pad conditioning.
Highlights
- Highly economical.
- Reduces scratching due to plate/pad contamination.
- Minimizes scratching from in-process handling.
- Prevents staining.
- Facilitates downstream cleaning processes.
- Minimizes plate/pad cleaning and maintenance.
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