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IC1000™
Urethane CMP pad
The IC1000™ pad is the industry-standard polishing pad for chemical mechanical planarization (CMP). It is made of a rigid, micro-porous polyurethane material. These properties enable the IC1000™ pad to deliver localized planarization, excellent removal rates, low global non-uniformity and low defectivity. The IC1000™ pad works effectively with slurries and conditioners to optimize CMP performance in tungsten, copper, ILD, STI, and polysilicon processes.
Product configuration
Thickness The standard thickness for an IC1000™ pad is 50 mils, but it is also offered in a thickness of 80 mils if a stiffer pad is required.
Optical endpoint Window IC1000™ pads are offered with a transparent urethane window to enable the optical endpoint technology in leading edge CMP tools. Advanced optical endpoint pads feature a window that is bonded to the IC1000™ pad to prevent slurry leakage and window delamination in all CMP processes.
Grooving IC1000™ pad is offered in a wide variety of grooving patterns across the surface of the pad. Please consult your local representative for the pattern that will meet the needs of your CMP applications.
Subpads A compressible subpad improves the global non-uniformity performance of IC1000™ pad. These pads are offered with a variety of subpads depending on the performance needs of the process. SUBA™ IV subpad is the industry standard subpad. SP2000™ subpads are the next generation of subpads, which offer improvements in reliability and performance.
Details
Base material Urethane
Shelf life 12 months
Packaging Pads are packaged face-to-face (polish side to polish side) and sealed inside a plastic bag to ensure cleanliness during transportation. The bags are taped to the side of the box to prevent the bag from slipping and damaging the pads. Pads should always remain flat. Bending pads during handling can cause wrinkles in the PSA and premature delamination of the release liner.
Applications Berylium, germanium, indium phosphide, nickel, polysilicon, sapphire, silicon carbide, tungsten, zinc selenide
Similar products
IC1000™ | IC1010™ CMP | IC1010™ CMP with window | |
---|---|---|---|
Base material | Urethane | Urethane | Urethane |
Compressibility % | 2.25 | 2.25 | 2.25 |
Hardness | 60 | 57 | 57 |
Hardness test | Shore D | Shore D | Shore D |
Thickness | 50 | 80 | 80 |
The data presented is a statistical representation for comparison purposes. The values are not necessarily a representation of the COA specifications.
IC1000™ is a trademark of DuPont®. Pureon is an authorized distributor for DuPont®.
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