Polishing Pads

IRINO-PROSiC

Composite polishing pad,
copper-resin matrix

Introducing the IRINO-PROSiC composite polishing pad, a cutting-edge addition to our IRINO family of composite polishing pads. Specifically engineered for the polishing of Silicon Carbide (SiC), IRINO-PROSiC is designed
to deliver superior results in SiC DMP (Direct Mechanical Planarization) processes.

When paired with the suspension PURE-DS-RT, IRINO-PROSiC excels in the Rapid Thinning process, offering a highly competitive alternative to traditional SiC DMP grinding methods. This innovative combination not only achieves
exceptional surface quality but also ensures impressive stock removal rates, making it ideal for applications requiring a smooth transition directly to CMP (Chemical Mechanical Planarization).

With its self-adhesive backing, IRINO-PROSiC can be effortlessly applied to any existing metal carrier plate, enhancing ease of use and efficiency in
SiC polishing applications. Whether you seek high surface quality or superior material removal, IRINO-PROSiC is the optimal choice for advanced SiC processing.

Highlights

Innovative polishing pad for Pureon’s Rapid Thinning process

Dressable system, suitable for single-side and double-side machines

Surface finishes down to 3 nm Ra

Best results if used with PURE-DS-RT suspensions from Pureon

Highly competitive compared
to grinding processes

Best choice for SiC polishing

Provides excellent workpiece geometry and Flatness, without edge round-off

Product specifications

Diameter

200
– 1200 mm

one-piece
bigger diameter multi-piece

Bond type

Resin

Layer thickness

1.0 mm

Base

Polycarbonate, self-adhesive backing

Applications

Polishing of Silicon Carbide (SiC)

Interested in
IRINO-PROSiC Polishing Pad?

We are happy to share our knowledge with you
and remain at your disposal for any further questions.

Malte Oellers