Polishing pads

For demanding polishing operation

Pre-polishing, fine polishing, super fine polishing, superfinishing, CMP polishing: Pureon offers a broad range of polishing pads suitable for a wide range of materials. The pad geometries and surfaces are optimized for high stock removal and superior surface finish making our pads versatile in most advanced applications.

Polishing pads for advanced materials

For the advanced materials sector, Pureon’s large product offering services a wide variety of materials including specialty substrates, semiconductor wafers, glass, ceramics, special metals, and plastics. All pad raw materials are manufactured by DuPont Advanced Materials with strict manufacturing process controls intended for use in semiconductor applications.

Advanced urethane pads

IC1000™

Urethane CMP pad

MHS15S

Urethane polishing pad

EXTERION™

Urethane polishing pad

EXTERION™ N4000H

Urethane polishing pad

IKONIC™ 4250L

Urethane polishing pad

Felt pads (non-woven)

SUBA™ IV

Felt polishing pad

SUBA™ X

Felt polishing pad

SUBA™ 800

Felt polishing pad

SUBA™ 600

Felt polishing pad

GS

Felt polishing pad

Finishing pads

POLITEX™

Poromeric polishing pad

OPTIVISION™

Poromeric polishing pad

IC OPTIC

Urethane CNC pad

Pad conditioning

DIAGRID™

Pad conditioner

Interested in our
polishing pads for advanced materials?

We are happy to share our knowledge with you
and remain at your disposal for any further questions.

Adam Nielse