EXTERION™ N4000H
Next-generation pad for multi-wafer batch polish
The EXTERION™ pad line uses a new advanced urethane formula specifically to achieve higher removal rates and lower pad wear. The
controlled porosity and tight distribution of the pore size result in longer pad lifetime. The EXTERION ™ N4000H pad is available
without sub-pad, and XY-Grooving for optimal slurry distribution for the large diameter platens.
Highlights
Achieves higher removal rates and lower pad wear
Formulated to meet the demands of SiC polishing applications
Available in multiple surface textures: plain and XY-grooved
Product Specifications
Base material
Urethane
Shelf life
12 months
Applications
Silicon carbide, various hard substrate
| Polishing pad | Base material | Compressibility [%] | Hardness | Hardness test | Density [g/cm³] |
|---|---|---|---|---|---|
| EXTERION™ N4000H | Urethane | 2.4 | 85 | JIS-A | 0.86 |
| MHS15S | Urethane | 3.0 | 84 | JIS-A | 0.80 |
Interested in our
polishing pads for advanced materials
We are happy to share our knowledge with you
and remain at your disposal for any further questions.
Adam Nielsen
- Product Manager
- +1 480-505-3425
- anielsen@pureon.com
