POLITEX™ (sometimes referred to as POLITEX™ Supreme), was originally developed for final wafer polishing. It is manufactured from
proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate is
designed to instantaneously recover from polishing compression, creating a pumping action that enhances slurry low within the pad to
produce optimum surface finish quality. This attribute reduces pad loading and increases pad life, which is well suited for final polishing
of silicon, oxide, glass or metals.