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Urethane polishing pad

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and aluminum disks. An advanced polyurethane formula is the base of all MH polishing pads. This formula produces a microcellular pore matrix throughout the material and yields an extremely tough, durable surface to withstand the demands of finishing and polishing with abrasives. The MH structure provides maximum use of the abrasive by embedding it into the top surface of the pad to allow greater cutting action and minimizing free particles that can contribute to scratching.


Base material  Urethane

Shelf life  12 months

Packaging  Pads are packaged face-to-face (polish side to polish side) and sealed inside a plastic bag to ensure cleanliness during transportation. The bags are taped to the side of the box to prevent the bag from slipping and damaging the pads. Pads should always remain flat. Bending pads during handling can cause wrinkles in the PSA and premature delamination of the release liner.

Applications  Berylium, cadmium zinc telluride, calcium fluoride, fused silica, lithium niobate, lithium tantalate, sapphire, stainless steel

Similar products

Base material Urethane
Compressibility % 3.05
Hardness 84
Hardness test JIS
Density (g/cm3) 0.5

The data presented is a statistical representation for comparison purposes. The values are not necessarily representative of the COA specifications.


For more detailed information, download our datasheet:

Interested in our polishing pads for advanced materials?


We are happy to share our knowledge with you and remain at your disposal for any further questions.

Adam Nielsen

Product Manager Polishing Pads for Advanced Materials