MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and aluminum disks. An advanced polyurethane formula is the base of all MH polishing pads. This formula produces a microcellular pore matrix throughout the material and yields an extremely tough, durable surface to withstand the demands of finishing and polishing with abrasives. The MH structure provides maximum use of the abrasive by embedding it into the top surface of the pad to allow greater cutting action and minimizing free particles that can contribute to scratching.