Polishing Pads


Polyurethane pad with
microcellular pore matrix

MH polishing pads are uniquely designed for polishing and 􀉾inishing a wide variety of surfaces where 􀉾latness and ultra-precision surface 􀉾inish is critical. These materials include glass surfaces, ceramic components, precision lenses, optics, and aluminum disks. An advanced polyurethane formula is the base of all MH polishing pads. This formula produces a microcellular pore matrix throughout the material and yields an extremely tough, durable surface to withstand the demands of 􀉾inishing and polishing with abrasives. The MH structure provides maximum use of the abrasive by embedding it into the top surface of the pad to allow greater cutting action and minimizing free particles that can contribute to scratching.


Open pore structure

Available in different thicknesses

Available in multiple surface textures such as plain and XY grooved

Product Specifications

Base material


Shelf life

12 months

Slurry additive Base material Compressibility [%] Hardness Hardness Test Thickness [mils]
MHS15S Urethane 3.05 84 JIS 0.5

Interested in our
MHS15S Polishing Pad?

We are happy to share our knowledge with you
and remain at your disposal for any further questions.

Adam Nielsen