This fall, Pureon, a leader in precision surface processing and polishing technologies, made a strong impact at two major global events: the International Conference on Silicon Carbide and Related Materials (ICSCRM) 2024 in Raleigh, USA, and the China International Optoelectronic Expo (CIOE) 2024 in Shanghai, China. Through its participation, Pureon continues to support the advancement of the semiconductor and optoelectronics industries worldwide.
As one of the premier conferences for Silicon Carbide technology, ICSCRM 2024 brought together top innovators and experts in the field to discuss the latest advancements. Pureon showcased our newest innovations for SiC machining, including IRINO-PROSiC, a polishing pad specifically designed for SiC applications, and PURE-DS-RT, a complementary suspension that enhances precision and efficiency. These products drew significant attention from attendees, underscoring our commitment to addressing the growing demand for advanced materials in the semiconductor industry.
Our team had the opportunity to engage with industry leaders, researchers, and potential partners, facilitating in-depth discussions on the future of SiC technologies and how Pureon’s solutions can contribute to the next wave of advancements. Moreover, our Head of R&D attended the industry sessions, further solidifying our position as a thought leader in the field.
“One key takeaway from ICSCRM 2024 is the critical role Silicon Carbide will play in next-generation power electronics, with Pureon positioned at the forefront of providing solutions that optimize SiC manufacturing processes”, confirms Dr. Ravi Bollina, CSO & Executive Board Member at Pureon.
This year marked Pureon’s first appearance as an exhibitor at the China International Optoelectronic Expo (CIOE) in Shenzhen. As one of the largest events in the optoelectronic field, CIOE gathers global players to showcase innovations in photonics, optoelectronics, and precision technologies. While the event predominantly focuses on optoelectronics, it also offers an important platform for companies involved in advanced optics — an area that aligns with Pureon’s expertise.
Our dedicated team on-site, led by Mage Pan, General Manager Pureon China, welcomed interested visitors at our special designed booth. Next to our consumables we highlighted the ULTRA-SOL OPTIQ polishing suspension and our SQUADRO-O / SQUADRO-OWH polishing pad specially optimized for fine grinding of optical components.
The ULTRA-SOL OPTIQ polishing suspension is tailored for ultra-precise polishing in optics applications, delivering exceptional surface quality and high efficiency. Similarly, our SQUADRO-O / SQUADRO-OWH polishing pad, developed for glass processing, garnered significant interest for its ability to provide consistent results in challenging high-performance applications.
As China’s precision industry continues to grow, CIOE offered Pureon an opportunity to establish valuable connections, gain insights into market trends, and present our technologies to a rapidly expanding market. The positive reception from attendees underscored the increasing demand for reliable, high-quality polishing solutions, reinforcing our commitment to supporting China’s advanced optics manufacturing sector.
Pureon’s participation at CIOE 2024 was a milestone in our journey to strengthen our presence in this important market. We are excited to build on the momentum generated at the event and continue offering innovative solutions to meet the evolving needs of the Chinese precision industry. We look forward to future opportunities to present our solutions globally, while staying committed to providing quality and value to our customers.